COMPOSITION FOR FORMING FILM, FILM, METHOD FOR MANUFACTURING PATTERNED SUBSTRATE, AND COMPOUND

摘要

PROBLEM TO BE SOLVED: To provide a composition for forming a film, from which such a resist underlay film can be formed that has excellent heat resistance and flatness while maintaining etching durability.SOLUTION: The composition for forming a film comprises a compound having a partial structure represented by formula (1) and a solvent. In the formula, Rto Reach independently represent a halogen atom, a hydroxy group, a nitro group, or a monovalent organic group having 1 to 20 carbon atoms; n1 and n2 each independently represent an integer of 0 to 2; b1 and b2 each independently represent an integer of 0 to 4; k1 and k2 each independently represent an integer of 0 to 9; and the above compound preferably has a group that forms an intermolecular bond.SELECTED DRAWING: None