发明名称 |
FORMING METHOD OF BANK AND MANUFACTURING METHOD OF ORGANIC EL ELEMENT |
摘要 |
PROBLEM TO BE SOLVED: To provide a forming method of a bank excellent in chemical resistant properties while having excellent liquid-repellent properties on a surface of the bank, and further to provide a manufacturing method of an organic EL element using the forming method of the bank.SOLUTION: A forming method of a bank 133 includes steps of: applying a photosensitive resist containing a liquid repellent material 141 to an element substrate 101 and forming a resist layer 140; exposing and developing the resist layer 140, performing patterning and forming the bank 133; applying first heat treatment to the element substrate 101 formed with the bank 133 in an atmosphere at a first temperature higher than a boiling point of solvent contained in the photosensitive resist; and placing the element substrate 101 applied with the first heat treatment on a hot plate and applying second heat treatment thereto at a second temperature higher than the boiling point of the solvent contained in the photosensitive resist.SELECTED DRAWING: Figure 8 |
申请公布号 |
JP2016062748(A) |
申请公布日期 |
2016.04.25 |
申请号 |
JP20140189730 |
申请日期 |
2014.09.18 |
申请人 |
SEIKO EPSON CORP |
发明人 |
WATANABE SHOTARO;ITO DAIKI |
分类号 |
H05B33/10;H01L51/50;H05B33/12;H05B33/22 |
主分类号 |
H05B33/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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