发明名称 FORMING METHOD OF BANK AND MANUFACTURING METHOD OF ORGANIC EL ELEMENT
摘要 PROBLEM TO BE SOLVED: To provide a forming method of a bank excellent in chemical resistant properties while having excellent liquid-repellent properties on a surface of the bank, and further to provide a manufacturing method of an organic EL element using the forming method of the bank.SOLUTION: A forming method of a bank 133 includes steps of: applying a photosensitive resist containing a liquid repellent material 141 to an element substrate 101 and forming a resist layer 140; exposing and developing the resist layer 140, performing patterning and forming the bank 133; applying first heat treatment to the element substrate 101 formed with the bank 133 in an atmosphere at a first temperature higher than a boiling point of solvent contained in the photosensitive resist; and placing the element substrate 101 applied with the first heat treatment on a hot plate and applying second heat treatment thereto at a second temperature higher than the boiling point of the solvent contained in the photosensitive resist.SELECTED DRAWING: Figure 8
申请公布号 JP2016062748(A) 申请公布日期 2016.04.25
申请号 JP20140189730 申请日期 2014.09.18
申请人 SEIKO EPSON CORP 发明人 WATANABE SHOTARO;ITO DAIKI
分类号 H05B33/10;H01L51/50;H05B33/12;H05B33/22 主分类号 H05B33/10
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