发明名称 |
SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SEMICONDUCTOR MANUFACTURING APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To improve yield of a layered chip and reduce the cost by reducing a positional deviation amount between layered chips.SOLUTION: A semiconductor device manufacturing method according to an embodiment comprises: a process of acquiring a position of a first semiconductor chip; a process of mounting a second semiconductor chip on the first semiconductor chip; a process of acquiring a position of the second semiconductor chip; a process of calculating a first deviation amount which is a deviation amount between the position of the first semiconductor chip and the position of the second semiconductor chip; and a process of performing first determination whether the first deviation amount is within a standard range.SELECTED DRAWING: Figure 6 |
申请公布号 |
JP2016062958(A) |
申请公布日期 |
2016.04.25 |
申请号 |
JP20140187676 |
申请日期 |
2014.09.16 |
申请人 |
TOSHIBA CORP |
发明人 |
FUKAYAMA SHINYA;OYAMA YUKIFUMI;MURAKAMI KAZUHIRO |
分类号 |
H01L21/60;H01L25/065;H01L25/07;H01L25/18 |
主分类号 |
H01L21/60 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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