发明名称 SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SEMICONDUCTOR MANUFACTURING APPARATUS
摘要 PROBLEM TO BE SOLVED: To improve yield of a layered chip and reduce the cost by reducing a positional deviation amount between layered chips.SOLUTION: A semiconductor device manufacturing method according to an embodiment comprises: a process of acquiring a position of a first semiconductor chip; a process of mounting a second semiconductor chip on the first semiconductor chip; a process of acquiring a position of the second semiconductor chip; a process of calculating a first deviation amount which is a deviation amount between the position of the first semiconductor chip and the position of the second semiconductor chip; and a process of performing first determination whether the first deviation amount is within a standard range.SELECTED DRAWING: Figure 6
申请公布号 JP2016062958(A) 申请公布日期 2016.04.25
申请号 JP20140187676 申请日期 2014.09.16
申请人 TOSHIBA CORP 发明人 FUKAYAMA SHINYA;OYAMA YUKIFUMI;MURAKAMI KAZUHIRO
分类号 H01L21/60;H01L25/065;H01L25/07;H01L25/18 主分类号 H01L21/60
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