发明名称 IMPRINT METHOD, IMPRINT DEVICE, AND METHOD OF MANUFACTURING ARTICLE
摘要 PROBLEM TO BE SOLVED: To provide a technique advantageous in high-precision overlaying of a pattern region on a mold with a shot region on a substrate.SOLUTION: An imprint method of molding an imprint material on a shot region formed on a substrate using a mold having a pattern region where a pattern is formed includes: a deformation step of deforming at least one of the pattern region and the shot region on the basis of information representing a shape of one of the pattern region and the shot region so that the shape of the pattern region and the shape of the shot region are more similar to each other; an estimation step of estimating a movement quantity of a mark due to the deformation in the region having been deformed in the deformation step; and an overlaying step of overlaying the pattern region with the shot region on the basis of detection results of positions of a mark of the pattern region and a mark of the shot region in the state of the deformation by the deformation step.SELECTED DRAWING: Figure 2
申请公布号 JP2016063054(A) 申请公布日期 2016.04.25
申请号 JP20140189443 申请日期 2014.09.17
申请人 CANON INC 发明人 NAKAGAWA KAZUKI
分类号 H01L21/027;B29C59/02;G03F9/00 主分类号 H01L21/027
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