发明名称 EUV LIGHT SOURCE SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide an EUV light source system which enables the further improvement of EUV light irradiance.SOLUTION: EUV light source system comprises: EUV light source devices X; and an optical system O. Each EUV light source device X includes a cavity resonator 1 and a hollow body 2 made of a non-magnetic insulator and extending in an internal space of the cavity resonator; an inert gas is supplied into an internal space of the hollow body. At least a part of a partition wall C20 between a first chamber C1 joined to a bottom-end part of the cavity resonator 1, and a second chamber C2 is composed of a transmission window M made of an EUV light-transmissive material. When electromagnetic waves are supplied to the internal space of the cavity resonator 1 and thus stationary waves are formed, the energy of the stationary waves is absorbed by the inert gas present in the internal space of the hollow body 2. Thus, plasma is generated, EUV light emitted by the plasma is radiated into the internal space of the second chamber C2 from the bottom-end part of the hollow body 2 through the internal space of the first chamber C1 and the transmission window M. The optical system serves to collect EUV light radiated by the EUV light source devices X.SELECTED DRAWING: Figure 1
申请公布号 JP2016062847(A) 申请公布日期 2016.04.25
申请号 JP20140191976 申请日期 2014.09.19
申请人 KANSAI UNIV 发明人 ONISHI MASAMI
分类号 H05G2/00;H01L21/027 主分类号 H05G2/00
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