发明名称 METHOD OF FABRICATING THE VARIABLE RESISTANCE MEMORY
摘要 A variable resistance memory device with improved reliability according to an embodiment of the present invention includes: preparing a substrate having a lower electrode; forming a mold layer on the substrate; forming a trench by patterning the mold layer; forming a variable resistance layer which includes a first part in the trench, and a second part on the upper surface of the mold layer, by filling the trench on the mold layer; and delaminating the second part of the variable resistance layer from the second part by applying a laser to the variable resistance layer, and forming a variable resistance element in the trench.
申请公布号 KR20160044142(A) 申请公布日期 2016.04.25
申请号 KR20140138431 申请日期 2014.10.14
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 AHN, JUN KU
分类号 H01L21/8247;H01L21/268;H01L21/56 主分类号 H01L21/8247
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