发明名称 |
METHOD OF FABRICATING THE VARIABLE RESISTANCE MEMORY |
摘要 |
A variable resistance memory device with improved reliability according to an embodiment of the present invention includes: preparing a substrate having a lower electrode; forming a mold layer on the substrate; forming a trench by patterning the mold layer; forming a variable resistance layer which includes a first part in the trench, and a second part on the upper surface of the mold layer, by filling the trench on the mold layer; and delaminating the second part of the variable resistance layer from the second part by applying a laser to the variable resistance layer, and forming a variable resistance element in the trench. |
申请公布号 |
KR20160044142(A) |
申请公布日期 |
2016.04.25 |
申请号 |
KR20140138431 |
申请日期 |
2014.10.14 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
AHN, JUN KU |
分类号 |
H01L21/8247;H01L21/268;H01L21/56 |
主分类号 |
H01L21/8247 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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