| 摘要 |
PROBLEM TO BE SOLVED: To allow simple replenishment of a metal material to a storage container arranged in a reaction furnace.SOLUTION: A semiconductor manufacturing apparatus which performs a deposition process on a substrate by supplying a material gas to the substrate installed in a reaction furnace and comprises: a storage container arranged in the reaction furnace, for storing a metal material to be a material of the material gas; an auxiliary container which is arranged in the reaction furnace and above the storage container and which is a bottomed container having an injection port of the metal material; a connection pipe for connecting an outflow port formed on the auxiliary container with the inside of the storage container; a sealing cock for sealing the outflow port in an openable and closable manner; and a heater part for heating the inside of the reaction furnace to a predetermined temperature required for a deposition process on the substrate while fusing the metal material in the auxiliary container and the metal material in the storage container.SELECTED DRAWING: Figure 1 |
