| 发明名称 |
Systems and Methods for Wet Processing Substrates with Rotating Splash Shield |
| 摘要 |
Embodiments provided herein provide systems and methods for wet processing substrates with a rotating splash shield. The systems include a fluid dispenser configured to dispense a processing fluid. A substrate support configured to support and rotate a substrate is also included. The substrate support is disposed such that the processing fluid dispensed by the fluid dispenser flows onto the substrate. A splash shield is positioned on at least one side of the substrate support and is configured to rotate. The splash shield has an upper portion extending above an upper surface of the substrate and a lower portion extending below a lower surface of the substrate. |
| 申请公布号 |
US2016111302(A1) |
申请公布日期 |
2016.04.21 |
| 申请号 |
US201414519363 |
申请日期 |
2014.10.21 |
| 申请人 |
Intermolecular, Inc. |
发明人 |
Kahlon Satbir;Donoso Bernardo;Lowe Jeffrey Chih-Hou;Sculac Robert |
| 分类号 |
H01L21/67;B08B3/02;B08B3/04;B05B15/04;B05B3/02 |
主分类号 |
H01L21/67 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A substrate processing system comprising:
a fluid dispenser configured to dispense a processing fluid; a substrate support configured to support and rotate a substrate, the substrate support being disposed such that the processing fluid dispensed by the fluid dispenser flows onto the substrate; and a splash shield on at least one side of the substrate support and configured to rotate with the substrate, wherein the splash shield has an upper portion extending above an upper surface of the substrate and a lower portion extending below a lower surface of the substrate. |
| 地址 |
San Jose CA US |
