发明名称 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING COLOUR FILTER, COLOUR FILTER AND LIQUID CRYSTAL DISPLAY DEVICE
摘要 A photosensitive resin composition, a method for manufacturing a colour filter, a colour filter and a liquid crystal display device. The photosensitive resin composition comprises an alkali-soluble resin (A), a compound having an ethylenically unsaturated group (B), a photoinitiator (C), a solvent (D) and a pigment (E). The alkali-soluble resin (A) comprises an alkali-soluble resin (A-1) and an alkali-soluble resin (A-2). The alkali-soluble resin (A-1) is obtained by reaction of a mixture. The mixture comprises an epoxy compound having at least two epoxy groups (a-1-1), a compound having at least one carboxylic group and at least one ethylenically unsaturated group (a-1-2), a tetracarboxylic acid or a dianhydride thereof (a-1-3) and a dicarboxylic acid or an anhydride thereof (a-1-4). The epoxy compound having at least two epoxy groups (a-1-1) has a structure as shown by the following formula (aI-1) or the following formula (aI-2). The photoinitiator (C) comprises a photoinitiator (C-1) represented by formula (1).
申请公布号 WO2016058551(A1) 申请公布日期 2016.04.21
申请号 WO2015CN92029 申请日期 2015.10.15
申请人 CHI MEI CORPORATION 发明人 WANG, DUANCHIH;HSIEH, BARYUAN;HSU, JUNGPIN;HSU, CHENGCHANG;HO, WEIKAI;KUO, YICHIA
分类号 G03F7/004;C07D209/86;C07D405/12;C07D409/06;C07D409/12;G02F1/1335;G03F7/027 主分类号 G03F7/004
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