| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma processing device which reduces a fluorine concentration in a membrane, and a plasma processing method.SOLUTION: The plasma processing device includes: a processing container; a rotary table 2 which is provided within the processing container and capable of mounting a wafer W on a top face; a first plasma processing region P1 which is provided at a predetermined position in a circumferential direction of the rotary table and in which first plasma processing is performed by generating first plasma from a first plasma gas; a second plasma processing region P2 which is provided separately from the first plasma processing region in a circumferential direction and in which second plasma processing is performed by generating second plasma from a second plasma gas; and two isolation regions D which are provided in each of two interval regions between the first plasma processing region and the second plasma processing region in a circumferential direction and prevent mixture of the first plasma gas and the second plasma gas by isolating the first plasma processing region and the second plasma processing region.SELECTED DRAWING: Figure 3 |
