| 摘要 |
To improve yield after polishing of a substrate for a magnetic disc. In the present invention, a slurry comprising a hydrophobic macromolecular material is passed through a filter having openings 100 nm or less in diameter, the slurry being the raw material for a polishing solution used in polishing the main surface of a substrate. Polishing is carried out by using the polishing solution after removing, using the filter, particles contained in the slurry that have a grain diameter greater than the average grain diameter of an abrasive grain. |
