| 发明名称 |
METHOD OF DEPOSITING TANTALUM TO FORM A TANTALUM COATING |
| 摘要 |
A method of depositing tantalum to form a tantalum coating on substrates is provided. The method comprises preparing a tantalum-containing mixture having a tantalum donor, a halide activator, and a tantalum halide activator; preparing a substrate for deposition of the tantalum from the tantalum-containing mixture; and heating the substrate and the tantalum-containing mixture to a given temperature to deposit the tantalum on the substrate. |
| 申请公布号 |
US2016108512(A1) |
申请公布日期 |
2016.04.21 |
| 申请号 |
US201414271903 |
申请日期 |
2014.05.07 |
| 申请人 |
Endurance Technologies Inc. |
发明人 |
Medvedovski Eugene |
| 分类号 |
C23C10/28;B32B15/01;C23C10/02 |
主分类号 |
C23C10/28 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method comprising:
preparing a tantalum-containing mixture having:
a tantalum donor;a halide activator; and,a tantalum halide activator; and preparing a substrate for deposition of tantalum from the tantalum-containing mixture; and, heating the substrate and the tantalum-containing mixture to a given temperature to deposit the tantalum on the substrate. |
| 地址 |
Calgary CA |
