发明名称 MULTI-MASK ALIGNMENT SYSTEM AND METHOD
摘要 In a multi-mask alignment system and method, a carrier frame is provided having a number of apertures therethrough. A number of shadow mask - frame combinations are also provided. Each shadow mask - frame combination includes a first set of alignment features and each shadow mask - frame combination is positioned on a first side of the carrier with the frame supporting the shadow mask in alignment with one of the apertures. An alignment system is provided and a control system including a programmed controller is also provided. Under the control of the controller, the alignment system is caused to adjust the position of each shadow mask - frame combination with respect to the carrier based on positions of the first set of alignment features determined by the controller.
申请公布号 WO2016061215(A1) 申请公布日期 2016.04.21
申请号 WO2015US55517 申请日期 2015.10.14
申请人 ADVANTECH GLOBAL, LTD;BUCCI, BRIAN, ARTHUR 发明人 BUCCI, BRIAN, ARTHUR
分类号 H01L21/68 主分类号 H01L21/68
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