发明名称 |
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR MANUFACTURING DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To manage an etching rate with ease and at low cost.SOLUTION: A method of manufacturing of a semiconductor device according to an embodiment includes a step of processing a plurality of substrates each comprising an etched object, with medical fluid. The medical fluid is repeatedly used, and an etching rate of the medical fluid is adjusted by being added with water.SELECTED DRAWING: Figure 1 |
申请公布号 |
JP2016058482(A) |
申请公布日期 |
2016.04.21 |
申请号 |
JP20140182267 |
申请日期 |
2014.09.08 |
申请人 |
TOSHIBA CORP |
发明人 |
IIMORI HIROYASU;OGATA TAKEHIRO;SUGITA TOMOHIKO |
分类号 |
H01L21/308;H01L21/304;H01L21/306 |
主分类号 |
H01L21/308 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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