发明名称 SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device capable of securing the reliability related to prevention of electromigration and stress migration by using a low-cost reflow process.SOLUTION: A semiconductor device comprises: an interlayer insulating layer with a contact hole; a first alloy part formed in the contact hole; a second alloy part that covers a surface of the interlayer insulating layer; and a first material part formed of a first material and that extends so as to cover the first alloy part and the second alloy part.SELECTED DRAWING: Figure 1
申请公布号 JP2016058492(A) 申请公布日期 2016.04.21
申请号 JP20140182558 申请日期 2014.09.08
申请人 MICRON TECHNOLOGY INC 发明人 TANAKA KATSUHIKO
分类号 H01L21/768;H01L23/522 主分类号 H01L21/768
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