发明名称 Desensitization of Aluminum Alloys Using Pulsed Electron Beams
摘要 A method for desensitizing an aluminum alloy is presented. A desired location on the surface of an aluminum alloy sample is exposed to a controlled pulsed electron beam. The pulsed electron beam heats a shallow layer of the metal alloy having a desired depth at the desired location on the surface of the sample to a temperature between a solvus temperature and an annealing temperature of the metal alloy to controllably reduce a degree of sensitization of the metal alloy sample at the desired location, an extent of a reduction in the degree of sensitization being controllable by varying at least one of a voltage, a current density, a pulse duration, a pulse frequency and a number of pulses of the electron beam.
申请公布号 US2016108504(A1) 申请公布日期 2016.04.21
申请号 US201514614686 申请日期 2015.02.05
申请人 The Government of the United States of America, as represented by the Secretary of the Navy 发明人 Sethian John D.;Myers Matthew C.;Wolford Mathew;Hegeler Frank;Holtz Ronald L.;Horton Derek;Lewis Alexis C.;Wahl Kathryn J.
分类号 C22F1/047;C21D1/34;C22C21/08 主分类号 C22F1/047
代理机构 代理人
主权项 1. A method for controllably desensitizing a metal alloy sample, comprising: exposing a specific desired location on a surface of the sample to a controlled pulsed electron beam having a voltage greater than 100 kV to about 650 kV: wherein the electron beam is controllably directed to the specific desired location without exposing other areas on the sample to the electron beam; and wherein the electron beam heats a shallow surface layer of the metal alloy having a desired depth at the specific desired location on the surface of the sample to a controlled temperature between a solvus temperature and an annealing temperature of the metal alloy without heating a bulk of the sample to controllably reduce a degree of sensitization of the metal alloy sample at the specific desired location, an extent of a reduction in the degree of sensitization being controllable by varying at least one of a voltage, a current density, a pulse duration, and a pulse frequency of the electron beam.
地址 Washington DC US