发明名称 |
HEAT TREATMENT APPARATUS AND HEAT TREATMENT METHOD |
摘要 |
A substrate inspection apparatus includes a mounting table, an inspection unit, a temperature control unit and a medium channel. The mounting table mounts thereon a substrate on which a semiconductor device is formed. The inspection unit inspects electrical characteristics of the semiconductor device on the mounted substrate. The temperature control unit controls a temperature of the mounting table. The medium channel passes through the mounting table. The temperature control unit includes a high-temperature medium supply unit supplies a high-temperature medium to the medium channel, a low-temperature medium supply unit supplies a low-temperature medium to the medium channel and a medium mixing unit mixes the high-temperature medium and the low-temperature medium which are supplied to the medium channel. |
申请公布号 |
US2016109508(A1) |
申请公布日期 |
2016.04.21 |
申请号 |
US201414779856 |
申请日期 |
2014.03.18 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
AKAIKE Yutaka;KOBAYASHI Dai |
分类号 |
G01R31/28;G01R31/26;G01R1/04 |
主分类号 |
G01R31/28 |
代理机构 |
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代理人 |
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主权项 |
1. A substrate inspection apparatus comprising:
a mounting table configured to mount thereon a substrate on which a semiconductor device is formed; an inspection unit configured to inspect electrical characteristics of the semiconductor device on the mounted substrate; a temperature control unit configured to control a temperature of the mounting table; and a medium channel passing through the mounting table, wherein the temperature control unit includes: a high-temperature medium supply unit configured to supply a high-temperature medium to the medium channel; a low-temperature medium supply unit configured to supply a low-temperature medium to the medium channel; and a medium mixing unit configured to mix the high-temperature medium and the low-temperature medium which are supplied to the medium channel. |
地址 |
Tokyo JP |