| 摘要 |
Provided is an electrical plating apparatus of a horizontal cell, comprising: a horizontal cell including an upper plating electrode cell and a lower plating electrode cell arranged on top and bottom, having a steel plate therebetween to store a plating solution inside, to easily remove the gas generated inside the horizontal cell; a conduct roll and a back-up roll arranged on a front and a rear end of the horizontal cell, and adhered to an upper and a lower surface of the steel plate; and a solution supply unit to supply the plating solution inside the horizontal cell. The upper plating electrode cell comprises: an upper base plate; and a plurality of upper positive electrode plates arranged and installed in an inner surface of the upper base plate. The upper base plate has a structure of at least one microhole to discharge an inner gas. According to the present invention, the apparatus is capable of increasing an efficiency of production of an electrical plating process. |
