发明名称 |
SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME |
摘要 |
A semiconductor device includes a first gate pattern and a second gate pattern on a substrate, the first gate pattern having a first height and the second gate pattern having a second height, an insulating pattern on the substrate covering the first and second gate patterns, the insulating pattern including a trench exposing the substrate between the first and second gate patterns, a spacer contacting at least a portion of a sidewall of the insulating pattern within the trench, the spacer spaced apart from the first and second gate patterns and having a third height larger than the first and second heights, and a contact structure filling the trench. |
申请公布号 |
US2016111506(A1) |
申请公布日期 |
2016.04.21 |
申请号 |
US201514744722 |
申请日期 |
2015.06.19 |
申请人 |
LEE Doo-Young;LEE Sang-Hyun;JUNG Myung-Hoon;KIM Do-Hyoung |
发明人 |
LEE Doo-Young;LEE Sang-Hyun;JUNG Myung-Hoon;KIM Do-Hyoung |
分类号 |
H01L29/417;H01L27/088;H01L29/45 |
主分类号 |
H01L29/417 |
代理机构 |
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代理人 |
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主权项 |
1. A semiconductor device comprising:
a first gate pattern and a second gate pattern on a substrate, the first gate pattern having a first height and the second gate pattern having a second height; an insulating pattern on the substrate covering the first and second gate patterns, the insulating pattern including a trench exposing the substrate between the first and second gate patterns; a spacer contacting at least a portion of a sidewall of the insulating pattern defining the trench, the spacer spaced apart from the first and second gate patterns and having a third height larger than the first and second heights; and a contact structure filling the trench. |
地址 |
Seoul KR |