| 摘要 |
[Problem] To provide a composition, and a method for forming a pattern using the same, with which it is possible to improve the surface roughness of a resist pattern. [Solution] Provided are: a composition containing a specific nitrogen-containing compound, an anionic surfactant including a sulfo group, and water; and a method for forming a pattern that includes a step applicable to a resist pattern in which the composition has been developed and then dried. |
