LASER LIGHT SOURCE DEVICE FOR EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE, AND LASER LIGHT SOURCE DEVICE

摘要

PROBLEM TO BE SOLVED: To suitably correct a wave face of laser beams varied by heat in an EUV light source device.SOLUTION: In an amplifying system 30 for amplifying laser beams output from a laser oscillation unit 20, at least one or more of wave face correcting units 34 and a sensor 36 are provided. The sensor 36 detects an angle (a direction) of the laser beams and variations of curvature ratio of a wave face, and outputs them. A wave face correcting controller (WFC-C) 50 outputs a signal to the wave face correcting unit 34 on the basis of measured result by the sensor 36. The wave face correcting unit 34 corrects wave faces of the laser beams to a specific wave face in accordance with an instruction from the wave face correcting controller (WFC-C) 50. Another wave face correcting unit and sensor can be provided also in a focusing system 40 which supplies the laser beams into a chamber 10.SELECTED DRAWING: Figure 1