发明名称 |
MANUFACTURING METHOD OF FLEXIBLE SUBSTRATE |
摘要 |
A manufacturing method of a flexible substrate is provided. The method comprises: coating a flexible substrate material and drying it; using a mask to expose the dried flexible substrate material, wherein the mask has a plurality of opaque regions distanced from each other, and the opaque regions form a designed pattern; developing the flexible substrate material to remove a portion of the flexible substrate material except the opaque regions; and curing the flexible substrate material to form a plurality of films comprising the flexible substrate material, which correspond to the designed pattern. |
申请公布号 |
US2016107926(A1) |
申请公布日期 |
2016.04.21 |
申请号 |
US201414404634 |
申请日期 |
2014.10.23 |
申请人 |
SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD |
发明人 |
Yao Jiangbo |
分类号 |
C03C17/00 |
主分类号 |
C03C17/00 |
代理机构 |
|
代理人 |
|
主权项 |
1. A manufacturing method of a flexible substrate, comprising:
coating a flexible substrate material comprising a photo-sensitive material onto a surface of a glass substrate; vacuum-drying the flexible substrate material; using a mask to expose the dried flexible substrate material, wherein the mask has a plurality of opaque regions which are distanced from each other, and the opaque regions form a designed pattern; developing the exposed flexible substrate material, so as to remove a portion of the flexible substrate material except the opaque regions; and curing the developed flexible substrate material, so as to form a plurality of films comprising the flexible substrate material, and the films correspond to the designed pattern; wherein a distance between each two of the adjacent opaque regions is from 0.5-50 millimeters; the flexible substrate material is Polyimide; the developed Polyimide is cured to form the plurality of films of Polyimide corresponding to the designed pattern; and a thickness of the films of Polyimide is in a range of 10-500 micrometers. |
地址 |
Shenzhen CN |