| 摘要 |
PROBLEM TO BE SOLVED: To provide a lithography device advantageous in terms of superposition.SOLUTION: A lithography device having a plurality of optical systems, and patterning in a plurality of stripe regions of a substrate, being scanned in the scanning direction, in parallel by the plurality of optical systems includes a plurality of detectors provided, respectively, for the plurality of optical systems and detecting the mark on the substrate, respectively, and a control section for identifying the plurality of stripe regions based on the information about the plurality of marks, when acceptable conditions relating to the plurality of marks, detected by the plurality of detectors in parallel with the patterning, are satisfied.SELECTED DRAWING: Figure 1 |
