发明名称 DUAL GATE FD-SOI TRANSISTOR
摘要 Circuit module designs that incorporate dual gate field effect transistors are implemented with fully depleted silicon-on-insulator (FD-SOI) technology. Lowering the threshold voltages of the transistors can be accomplished through dynamic secondary gate control in which a back-biasing technique is used to operate the dual gate FD-SOI transistors with enhanced switching performance. Consequently, such transistors can operate at very low core voltage supply levels, down to as low as about 0.4 V, which allows the transistors to respond quickly and to switch at higher speeds. Performance improvements are shown in circuit simulations of an inverter, an amplifier, a level shifter, and a voltage detection circuit module.
申请公布号 US2016111534(A1) 申请公布日期 2016.04.21
申请号 US201514985264 申请日期 2015.12.30
申请人 STMICROELECTRONICS INTERNATIONAL N.V. 发明人 KUMAR Anand;AGRAWAL Ankit
分类号 H01L29/78;H01L29/66;H01L21/311;H01L21/762;H01L29/51;H01L29/06;H01L21/265 主分类号 H01L29/78
代理机构 代理人
主权项 1. A pass gate formed on a silicon substrate, the pass gate comprising a fully-depleted silicon-on-insulator (FD-SOI) dual gate transistor configured with a source terminal, a drain terminal, a primary gate, and a secondary gate oriented in a direction transverse to the primary gate.
地址 Amsterdam NL