发明名称 SYSTEMS AND METHODS FOR INTERNAL SURFACE CONDITIONING ASSESSMENT IN PLASMA PROCESSING EQUIPMENT
摘要 In an embodiment, a plasma source includes a first electrode, configured for transfer of one or more plasma source gases through first perforations therein; an insulator, disposed in contact with the first electrode about a periphery of the first electrode; and a second electrode, disposed with a periphery of the second electrode against the insulator such that the first and second electrodes and the insulator define a plasma generation cavity. The second electrode is configured for movement of plasma products from the plasma generation cavity therethrough toward a process chamber. A power supply provides electrical power across the first and second electrodes to ignite a plasma with the one or more plasma source gases in the plasma generation cavity to produce the plasma products. One of the first electrode, the second electrode and the insulator includes a port that provides an optical signal from the plasma.
申请公布号 WO2016060801(A1) 申请公布日期 2016.04.21
申请号 WO2015US51636 申请日期 2015.09.23
申请人 APPLIED MATERIALS, INC 发明人 PARK, SOONAM;ZHU, YUFEI;SUAREZ, EDWIN C.;INGLE, NITIN K.;LUBOMIRSKY, DMITRY;HUANG, JIAYIN
分类号 H01L21/205;H01L21/3065 主分类号 H01L21/205
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