发明名称 ELECTROSTATIC CHUCK DEVICE
摘要 This electrostatic chuck device 80 is sequentially provided, in the following order, with: an electrostatic chuck part 2 that has one main surface serving as a stage surface on which a plate-like sample is placed, while containing an internal electrode for electrostatic suction inside; a first bonding layer 4; a sheet material 6; a second bonding layer 8; and a base part 10 for temperature regulation, which regulates the temperature of the electrostatic chuck part 2 to a desired temperature. The first bonding layer 4 comprises a joining layer 14 that has a thickness of 1-500 nm and a silicone adhesive layer 24 that has a thickness of 2-30 μm. The second bonding layer 8 comprises a joining layer 18 that has a thickness of 1-500 nm and a silicone adhesive layer 28 that has a thickness of 2-30 μm.
申请公布号 WO2016060205(A1) 申请公布日期 2016.04.21
申请号 WO2015JP79188 申请日期 2015.10.15
申请人 SUMITOMO OSAKA CEMENT CO., LTD. 发明人 ITO, TOMOMI;MIURA, YUKIO
分类号 H01L21/683 主分类号 H01L21/683
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