LITHOGRAPHIC APPARATUS

摘要

A lithographic apparatus including a substrate table position measurement system and a projection system position measurement system to measure a position of the substrate table and the projection system, respectively. The substrate table position measurement system includes a substrate table reference element mounted on the substrate table and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to the holding plane of a substrate on substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame.

主权项

1. A lithographic apparatus, comprising:
a substrate table arranged to hold a substrate, a substrate table position measurement system comprising a sensor head, a sensor frame and a substrate table reference element, and an interferometer system, wherein the sensor head is configured to cooperate with the substrate table reference element arranged at a bottom side of the substrate table, wherein the sensor head is arranged on the sensor frame, wherein the interferometer system is arranged to detect a thermal deformation or vibrations of the sensor frame.