发明名称 PRESSURE SET POINT DETERMINATION METHOD FOR INSPECTION IN WAFER INSPECTION DEVICE
摘要 PROBLEM TO BE SOLVED: To determine a pressure set point of an optimal negative pressure that assures a desired overdrive amount by a vacuum suction force in wafer inspection in which a probe card and a wafer are contacted by a pressure.SOLUTION: In a prober, a pressure of a vacuum suction force applied between a probe card 36 and a wafer W within an enclosed space 82 by evacuation of a third vacuum mechanism 92 is made substantially accurately matched with a pressure of a pressing force that is applied between the probe card 36 and the wafer W by chuck top push-up of a movable stage 22 applied before the evacuation. This is because, regarding each of the probe cards 36 to be used in the prober, the third vacuum mechanism 92 for the overdrive holding reduces the pressure within the enclosed space 82 to a pressure set point Pthat is determined by pressure set point determination processing (method) for inspection under control of a controller.SELECTED DRAWING: Figure 3
申请公布号 JP2016058506(A) 申请公布日期 2016.04.21
申请号 JP20140182897 申请日期 2014.09.09
申请人 TOKYO ELECTRON LTD 发明人 YAMADA HIROSHI
分类号 H01L21/66;G01R31/28 主分类号 H01L21/66
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