| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist composition having excellent performance in characteristics such as dissolution contrast, MEF performance and dimensional stability performance in organic solvent development, a pattern forming method using the resist composition, and a polymeric compound.SOLUTION: The resist composition comprises a polymeric compound having a repeating unit represented by general formula (1) and at least one of repeating units represented by general formulae (2A), (2B) or (2C).SELECTED DRAWING: Figure 1 |
