PHOTOSENSITIVE COMPOSITION, IMPRINTING METHOD, AND INTERCALATION LAYER

摘要

PROBLEM TO BE SOLVED: To provide a photosensitive composition capable of reducing pattern defects attributed to molecular contaminants.SOLUTION: The photosensitive composition is so configured that a total sum of a product of an SP value and a mass percentage, which are solubility parameters of each component contained in the composition, is within a range of 16 to 20 [(J/cm)] based on 100 mass parts.SELECTED DRAWING: Figure 2