发明名称 |
System, Method and Apparatus for Improving Accuracy of RF Transmission Models for Selected Portions of an RF Transmission Path |
摘要 |
Systems and methods for determining an RF transmission line model for an RF transmission system includes generating a baseline RF transmission line model characterizing the RF transmission system. A plasma RF voltage, RF current, RF power and/or a corresponding RF induced DC bias voltage is calculated from the baseline RF transmission line model. An end module including the electrostatic chuck, a plasma and an RF return path is added to the baseline RF transmission line model to create one or more revised RF transmission line models. A revised plasma RF voltage, a revised plasma RF current, a revised plasma RF power and/or a corresponding revised RF induced DC bias voltage is calculated from each of the revised baseline RF transmission line models. The revised RF transmission line models are scored to identify a best fitting revised RF transmission line model as a complete RF transmission line model. |
申请公布号 |
US2016109863(A1) |
申请公布日期 |
2016.04.21 |
申请号 |
US201414519081 |
申请日期 |
2014.10.20 |
申请人 |
Lam Research Corporation |
发明人 |
Valcore, Jr. John C.;Povolny Henry |
分类号 |
G05B13/04;G06F17/50 |
主分类号 |
G05B13/04 |
代理机构 |
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代理人 |
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主权项 |
1. Method for determining an RF transmission line model for a complete RF transmission system comprising:
generating a baseline RF transmission line model characterizing the RF transmission system, the baseline RF transmission line model having a plurality of stages ending at an input to an electrostatic chuck; calculating at least one of a plasma RF voltage (Vrf), and/or a plasma RF current (Irf) and/or a plasma RF power (Prf) from the baseline RF transmission line model based on an empirically measured RF induced DC bias voltage; adding an end module to the baseline RF transmission line model to create at least one revised RF transmission line model, the end module including the electrostatic chuck, a plasma and an RF return path; calculating at least one of a revised plasma RF voltage (V′rf) and/or a revised plasma RF current (I′rf) and/or a revised plasma RF power (P′rf) and/or a corresponding revised RF induced DC bias voltage from each of the at least one revised baseline RF transmission line models; scoring each one of the at least one revised RF transmission line models to identify a best fitting revised RF transmission line model; and recording the best fitting revised RF transmission line model as a complete RF transmission line model. |
地址 |
Fremont CA US |