发明名称 |
MASK AND ITS MANUFACTURING METHOD, EXPOSURE, AND SEMICONDUCTOR DEVICE FABRICATION METHOD |
摘要 |
A mask arranges a predetermined pattern and an auxiliary pattern smaller than the predetermined pattern so that where a virtual lattice is assumed which has a lattice point located at a center of the predetermined pattern, a center of the auxiliary pattern is offset from the lattice point of the virtual lattice. |
申请公布号 |
EP1450206(B1) |
申请公布日期 |
2016.04.20 |
申请号 |
EP20040003772 |
申请日期 |
2004.02.19 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
YAMAZOE, KENJI;SAITOH, KENJI;SUZUKI, AKIYOSHI |
分类号 |
G03F1/36;H01L21/027;G03F1/00 |
主分类号 |
G03F1/36 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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