| 摘要 |
PROBLEM TO BE SOLVED: To provide a cushion material for polishing exhibiting excellent cushion properties even at polishing at low pressure and capable of retaining an object to be polished and an abrasive flat.SOLUTION: In the cushion material for polishing, an adhesive layer 12a is integrally laminated on one of surfaces of a foamed sheet 11, and the foamed sheet 11 satisfies at least one of conditions that a thickness is 0.3 to 3.0 mm, density is 400 to 600 kg/m, tensile strength is 1.0 to 3.0 MPa, elongation is 130 to 160%, Shore (A) hardness is 25 to 40, and compression stress at 25% is 0.30 to 0.60 MPa. |
