发明名称 SEMICONDUCTOR DEVICE AND PRODUCTION METHOD THEREFOR
摘要 In order to improve characteristics of an IGBT, particularly, to reduce steady loss, turn-off time and turn-off loss, a thickness of a surface semiconductor layer is set to about 20 nm to 100 nm in an IGBT including: a base layer; a buried insulating film provided with an opening part; the surface semiconductor layer connected to the base layer below the opening part; a p type channel forming layer formed in the surface semiconductor layer; an n + type source layer; a p + type emitter layer; a gate electrode formed over the surface semiconductor layer via a gate insulating film; an n + type buffer layer; and a p type collector layer.
申请公布号 EP2541604(A4) 申请公布日期 2016.04.20
申请号 EP20100846515 申请日期 2010.02.25
申请人 RENESAS ELECTRONICS CORPORATION 发明人 ARAI, DAISUKE;NAKAZAWA, YOSHITO;HOSOYA, NORIO
分类号 H01L29/739;H01L21/336;H01L29/06;H01L29/12;H01L29/40;H01L29/66;H01L29/78;H01L29/786 主分类号 H01L29/739
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