| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a template that does not require a complicated suction mechanism for an imprint device by preventing resist from oozing out to an adjacent field and making a gap between shots. <P>SOLUTION: There is provided a template for semiconductor imprint such that a template having an uneven pattern formed is pressed against a photocuring material and the uneven pattern is transferred by optically curing the photocuring material, and the template is provided with an auxiliary pattern which assists the photocuring material in making a wet spread uniformly along a field edge of the template by capillarity, and absorbs an excessive photocuring material, the auxiliary pattern being a line pattern comprising a plurality of segmented recessed parts provided at a periphery of the field edge in parallel with the field edge. <P>COPYRIGHT: (C)2013,JPO&INPIT |
