发明名称 FILLING THROUGH-HOLES
摘要 Pulse plating methods which include a forward pulse but no reverse pulse inhibit or reduce dimpling and voids during copper electroplating of through-holes in substrates such as printed circuit boards. The pulse plating methods may be used to fill through-holes with copper where the through-holes are coated with electroless copper or flash copper.
申请公布号 EP3009533(A1) 申请公布日期 2016.04.20
申请号 EP20150189090 申请日期 2015.10.09
申请人 ROHM AND HAAS ELECTRONIC MATERIALS LLC 发明人 JAYARAJU, NAGARAJAN;BARSTAD, LEON R.;NAJJAR, ELIE H.
分类号 C25D7/12;C25D5/18;H05K3/42 主分类号 C25D7/12
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