发明名称 Ultraviolet light generating target, electron-beam-excited ultraviolet light source, and method for producing ultraviolet light generating target
摘要 An ultraviolet light generating target 20 includes a substrate 21 made of sapphire, quartz, or rock crystal; and a light-emitting layer 22 that is provided on the substrate 21 and that generates ultraviolet light upon receiving an electron beam. The light-emitting layer 22 includes powdered or granular Pr:LuAG crystals. By using such a light-emitting layer 22 as the target, the ultraviolet light generating efficiency can be increased more remarkably than when a Pr:LuAG single crystal film is used.
申请公布号 US9318312(B2) 申请公布日期 2016.04.19
申请号 US201214113383 申请日期 2012.04.24
申请人 HAMAMATSU PHOTONICS K.K. 发明人 Honda Yoshinori;Fukuyo Fumitsugu;Kasamatsu Yuji;Suzuki Takashi;Hattori Takeaki;Kawai Koji;Chu Shucheng;Taketomi Hiroyuki
分类号 G01J1/42;G01N21/64;H01J63/02;H01J29/20;H01J63/06;C09K11/77;H01J63/04 主分类号 G01J1/42
代理机构 Drinker Biddle & Reath LLP 代理人 Drinker Biddle & Reath LLP
主权项 1. An electron-beam-excited ultraviolet light source, comprising: an ultraviolet light generating target including a substrate made of sapphire, quartz, or rock crystal, and a light-emitting layer provided on the substrate and generating ultraviolet light upon receiving an electron beam; an electron source providing an electron beam to the ultraviolet light generating target; and a vacuum-pumped container in which the ultraviolet light generating target and the electron source are arranged, wherein the light-emitting layer includes powdered or granular Pr:LuAG crystals, the electron beam is incident on the light-emitting layer through a conductive film, and the ultraviolet light generated in the light-emitting layer output from the substrate.
地址 Hamamatsu-shi, Shizuoka JP