发明名称 Image sensor device and method
摘要 A system and method for blocking heat from reaching an image sensor in a three dimensional stack with a semiconductor device. In an embodiment a heat sink is formed in a back end of line process either on the semiconductor device or else on the image sensor itself when the image sensor is in a backside illuminated configuration. The heat sink may be a grid in either a single layer or in two layers, a zig-zag pattern, or in an interleaved fingers configuration.
申请公布号 US9318528(B2) 申请公布日期 2016.04.19
申请号 US201514880720 申请日期 2015.10.12
申请人 Taiwan Semiconductor Manufacturing Company, Ltd. 发明人 Huang Kuo-Chin;Wang Tzu-Jui;Chen Szu-Ying;Yaung Dun-Nian;Liu Jen-Cheng;Chou Bruce C. S.;Tu Jung-Kuo;Hsieh Cheng-Chieh
分类号 H01L21/00;H01L27/146;H01L31/024 主分类号 H01L21/00
代理机构 Slater & Matsil, L.L.P. 代理人 Slater & Matsil, L.L.P.
主权项 1. A method of manufacturing a semiconductor device, the method comprising: forming a pixel within an image sensor; bonding the image sensor to a semiconductor device, the semiconductor device comprising a substrate and a heat sink at least partially located in a first metallization layer between the pixel and the substrate; and forming a thermal via extending through the image sensor and in thermal connection with the heat sink.
地址 Hsin-Chu TW