发明名称 |
Image sensor device and method |
摘要 |
A system and method for blocking heat from reaching an image sensor in a three dimensional stack with a semiconductor device. In an embodiment a heat sink is formed in a back end of line process either on the semiconductor device or else on the image sensor itself when the image sensor is in a backside illuminated configuration. The heat sink may be a grid in either a single layer or in two layers, a zig-zag pattern, or in an interleaved fingers configuration. |
申请公布号 |
US9318528(B2) |
申请公布日期 |
2016.04.19 |
申请号 |
US201514880720 |
申请日期 |
2015.10.12 |
申请人 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
发明人 |
Huang Kuo-Chin;Wang Tzu-Jui;Chen Szu-Ying;Yaung Dun-Nian;Liu Jen-Cheng;Chou Bruce C. S.;Tu Jung-Kuo;Hsieh Cheng-Chieh |
分类号 |
H01L21/00;H01L27/146;H01L31/024 |
主分类号 |
H01L21/00 |
代理机构 |
Slater & Matsil, L.L.P. |
代理人 |
Slater & Matsil, L.L.P. |
主权项 |
1. A method of manufacturing a semiconductor device, the method comprising:
forming a pixel within an image sensor; bonding the image sensor to a semiconductor device, the semiconductor device comprising a substrate and a heat sink at least partially located in a first metallization layer between the pixel and the substrate; and forming a thermal via extending through the image sensor and in thermal connection with the heat sink. |
地址 |
Hsin-Chu TW |