| 发明名称 | Colored radiation-sensitive composition for color filter, pattern forming method, color filter and method of producing the same, and solid-state image sensor | ||
| 摘要 | A colored radiation-sensitive composition for a color filter that includes (A) a pigment, (B) a photopolymerization initiator, and (C) a polymerizable compound, in which the colored radiation-sensitive composition satisfies the following conditions: when a colored radiation-sensitive composition layer is formed from the colored radiation-sensitive composition such that spectral transmittance at 600 nm becomes 30%, the colored radiation-sensitive composition layer includes the following characteristics: (1) spectral transmittance at 400 nm is 20% or less; (2) spectral transmittance at 550 nm is 10% or less; (3) spectral transmittance at 700 nm is 70% or more; (4) a wavelength resulting in 50% spectral transmittance is in a range of from 650 nm to 680 nm; and (5) a film thickness of the colored radiation-sensitive composition layer is in a range of from 0.55 μm to 1.8 μm. | ||
| 申请公布号 | US9318522(B2) | 申请公布日期 | 2016.04.19 |
| 申请号 | US201414148076 | 申请日期 | 2014.01.06 |
| 申请人 | FUJIFILM Corporation | 发明人 | Aoyagi Kaoru |
| 分类号 | G02B5/20;G03F7/004;H01L27/146;G03F7/031;G02B5/22;G02B5/23;G03F7/00;G03F7/105;G03F7/027 | 主分类号 | G02B5/20 |
| 代理机构 | Sughrue Mion, PLLC | 代理人 | Sughrue Mion, PLLC |
| 主权项 | 1. A colored radiation-sensitive composition for a color filter, comprising (A) a pigment, (B) a photopolymerization initiator, and (C) a polymerizable compound, and (D) an ultraviolet absorber, wherein the total content of (A) the pigment is from 5% by mass to 50% by mass with respect to the total solids content of the colored radiation-sensitive composition, and wherein the colored radiation-sensitive composition satisfies the following conditions: when a colored radiation-sensitive composition layer is formed from the colored radiation-sensitive composition such that spectral transmittance at 600 nm becomes 30%, the colored radiation-sensitive composition layer comprises the following characteristics: (1) spectral transmittance at 400 nm is 20% or less; (2) spectral transmittance at 550 nm is 10% or less; (3) spectral transmittance at 700 nm is 70% or more; (4) a wavelength resulting in 50% spectral transmittance is in a range of from 650 nm to 680 nm; and (5) a film thickness of the colored radiation-sensitive composition layer is in a range of from 0.55 μm to 1.8 μm. | ||
| 地址 | Tokyo JP | ||