发明名称 Pattern forming method, actinic-ray-sensitive or radiation-sensitive resin composition, and resist film
摘要 Provided is a pattern forming method that is excellent in roughness performance such as line width roughness and exposure latitude, and an actinic-ray-sensitive or radiation-sensitive resin composition and a resist film used for the pattern forming method.;The pattern forming method includes (1) forming a film using an actinic-ray-sensitive or radiation-sensitive resin composition containing a resin that includes 65 mol % or more of a repeating unit having a group which generates a polar group by being degraded by the action of an acid based on all repeating units in the resin and at least one kind of repeating unit represented by the following General Formula (I) or (II), (2) exposing the film, and (3) developing the exposed film using a developer that contains an organic solvent.;
申请公布号 US9316910(B2) 申请公布日期 2016.04.19
申请号 US201213406306 申请日期 2012.02.27
申请人 FUJIFILM Corporation 发明人 Kataoka Shohei;Takahashi Hidenori;Yamaguchi Shuhei;Saitoh Shoichi;Shirakawa Michihiro;Yoshino Fumihiro
分类号 G03F7/20;G03F7/039 主分类号 G03F7/20
代理机构 Sughrue Mion, PLLC 代理人 Sughrue Mion, PLLC
主权项 1. A pattern forming method comprising: (1) forming a film by using an actinic-ray-sensitive or radiation-sensitive resin composition containing a resin that includes; 65 mol % or more of a repeating unit represented by the following General Formula (AI) as a repeating unit having a group which generates a polar group by being degraded by the action of an acid based on all repeating units in the resin, and at least one kind of repeating unit represented by the following General Formula (I) or (II); (2) exposing the film; and (3) developing the exposed film using a developer that contains an organic solvent: wherein in General Formula (AI), Xa1 represents a hydrogen atom, a methyl group which may have a substituent, or a group represented by —CH2—R9, where R9 represents a hydrogen atom or a monovalent organic group; T represents a single bond; and each of Rx1 to Rx3 independently represents an alkyl group or a cycloalkyl group; and two or more of Rx1 to Rx3 may form a cycloalkyl group by binding to each other, wherein in General Formulae (I) and (II), each of R11 and R21 independently represents a hydrogen atom or an alkyl group; each of R12 and R22 independently represents an alkyl group, a cycloalkyl group, an alkoxy group, an alkoxycarbonyl group, a carboxyl group, a halogen atom, a hydroxyl group, or a cyano group; each of R13 and R23 independently represents an alkylene group, a cycloalkylene group, or a combination thereof, provided that when a plurality of R13s are present, each R13 may be the same as or different from each other, and provided that when a plurality of R23s are present, each R23 may be the same as or different from each other; each of Y1 and Y2 independently represents a single bond, an ether bond, an ester bond, an amide bond, a urethane bond, or a ureylene bond, provided that when a plurality of Y1s are present, each Y1 may be the same as or different from each other, and provided that when a plurality of Y2s are present, each Y2 may be the same as or different from each other; each of X1 and X2 independently represents a methylene group, a methyl methylene group, a dimethyl methylene group, an ethylene group, an oxygen atom, or a sulfur atom, each of m1 and m2 independently represents an integer of 0 to 4; each of n1 and n2 independently represents an integer of 0 to 4, provided that when n1 is 2 or greater, a plurality of R12s may be the same as or different from each other or may form a ring by binding to each other, and provided that when n2 is 2 or greater, a plurality of R22s may be the same as or different from each other or may form a ring by binding to each other.
地址 Tokyo JP