发明名称 SENSOR SYSTEM FOR SEMICONDUCTOR MANUFACTURING APPARATUS
摘要 A chamber monitoring system may include a parallel architecture in which a single sensor control system is coupled to a number of different processing chamber control board sensor lines. In an embodiment of the present invention, a single rotation sensor such as a tachometer may reside in a central control unit remote from the processing chambers such that rotation data may be processed by a single system and thereafter routed according to a variety of different network communication protocols to the main system controller, a factory interface, or both. In the present and other embodiments, pull-up networks in the central control unit and the chamber control boards are matched so as to reduce electrical signal anomalies such as crowbar effects. The central control unit may be programmed via a main system controller to operate according to user defined parameters, which in turn may enable the system to differentiate between certain operating states.
申请公布号 KR20160042410(A) 申请公布日期 2016.04.19
申请号 KR20160039505 申请日期 2016.03.31
申请人 APPLIED MATERIALS, INC. 发明人 SCHAUER RONALD VERN;DASCOLI RAPHAEL;BHARGAVA SHIVAN
分类号 H01L21/67;C23C14/50;H01L21/66;H01L21/68;H01L21/683;H01L21/687 主分类号 H01L21/67
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