| 主权项 |
1. An exposure apparatus comprising:
a light source unit configured to emit light; a substrate stage configured to support a substrate that has an exposure area and a non-exposure area; and a prism unit disposed between the light source unit and the substrate stage, the prism unit movable so as to transmit the light to the exposure area and to block the light from the non-exposure area; wherein the prism unit comprises a first prism and a second prism positioned with a gap therebetween, the first and second prisms having substantially a same shape, wherein the first prism has a first surface and a second surface, the first prism movable so that the light is incident upon the first surface and the second surface selectively reflects or transmits the light, wherein when the prism unit overlaps the exposure area, the first prism is movable so as to transmit the light through the second surface, wherein a first angle θ1 between the light incident on the first surface and a normal of the second surface is smaller than sin−1(no/n1), where n is a refractive index of the first prism, and no is a refractive index of a space outside the first prism, wherein when the prism unit overlaps the non-exposure area, the first prism is movable so as to substantially reflect the light, and wherein a second angle θ2 between the light incident on the first surface and the normal of the second surface is greater than or equal to sin−1(no/n1). |
