| 摘要 |
The present invention relates to an apparatus to deposit a monomer in a vacuum. According to the apparatus to deposit the monomer in the vacuum of the present invention, the apparatus to deposit the monomer on a substrate comprises: a vacuum chamber receiving the substrate, and arranged as a vacuum state; a base part received inside the vacuum chamber, having a wider area than the substrate, and opposing the substrate; a nozzle part disposed in a number of rows on the base part, discharging the monomer toward the substrate such that the monomer is deposited on the substrate without movement of the substrate and the base part; and a curing part including a light source part disposed outside the vacuum chamber and a light guide part disposed between the nozzle parts, and guiding an ultraviolet ray irradiated from the light source part to the substrate. According to the present invention, since the ultraviolet ray irradiated from the light source part disposed outside the vacuum chamber is guided toward the substrate disposed inside the vacuum chamber, the distance between the nozzle parts is not affected, which provides the apparatus to deposit the monomer in the vacuum capable of obtaining excellent deposition efficiency. |
