发明名称 Plasma device
摘要 A plasma device including a casing, a first electrode, a second electrode, a nozzle and a gas ejection port is provided. The casing has a first chamber. The first electrode is disposed within the first chamber and has a second chamber. The second electrode capable of rotating in relative to the casing has a third chamber connected with the second chamber. The second chamber and the third chamber are adapted for accommodating plasma formed between the first electrode and the second electrode. The nozzle and the gas ejection port are independently disposed at the bottom of the second electrode respectively, wherein the nozzle is configured to eject the plasma, and forms an included angle with or is spaced a distance apart from a rotating axis of the second electrode. The gas ejection port is configured to eject cold gas.
申请公布号 US9320125(B2) 申请公布日期 2016.04.19
申请号 US201414509051 申请日期 2014.10.08
申请人 Creating Nano Technologies, Inc. 发明人 Hsu Yi-Ming;Wang Li-Min;Li An-Jen
分类号 H01J37/32;H05H1/34 主分类号 H01J37/32
代理机构 Jianq Chyun IP Office 代理人 Jianq Chyun IP Office
主权项 1. A plasma device, comprising: a first electrode; a second electrode, disposed corresponding to the first electrode, wherein the second electrode is capable of rotating in relative to the first electrode, and a plasma is adapted to be formed between the first electrode and the second electrode; and a nozzle and a gas ejection port, independently disposed at the bottom of the second electrode respectively, wherein the nozzle is configured to eject the plasma, and forms an included angle with or is spaced a distance apart from a rotating axis of the second electrode, and the gas ejection port is configured to eject a cold gas.
地址 Tainan TW