Magnetic sensor and forming method

摘要

The present disclosure relates to a MEMS device with a magnetic film disposed on a first substrate, and an associated method of formation. In some embodiments, the magnetic film is disposed on a planar front surface of the first substrate such that depositing and patterning processes of the magnetic film is improved. A sensing gap of a MEMS device associated with the magnetic film is located between the magnetic film and a recessed lateral surface of a second substrate. The second substrate is bonded to the first substrate at front surfaces of the first and second substrate. Forming the magnetic film on the planar front allows for patterning of the magnetic film without leaving unwanted residues of magnetic material. Without the unwanted residue of magnetic material, less contamination from the magnetic material is introduced after dry etching and passivation processes, improving yield and reliability of the MEMS device.

主权项

1. A MEMS device, comprising:
a first substrate having a first protrusion and a second protrusion extending outward from a lateral surface of the first substrate; a magnetic film disposed on the first protrusion; and a second substrate bonded to the second protrusion; a second sensing gap located between the lateral surface of the first substrate and a front surface of the second substrate; wherein the magnetic film is separated from the second substrate by a first sensing gap; wherein the first sensing gap is associated with a first MEMS device comprising a magnetic field sensor; and wherein the second sensing gap is associated with a second MEMS device that is different than the first MEMS device.