发明名称 |
Semiconductor device and method of manufacturing same |
摘要 |
In a semiconductor device in which a plurality of semiconductor chips are stacked, performance is enhanced without deteriorating productivity. The semiconductor device has a first semiconductor substrate having a first surface and a second surface opposite the first surface, a first insulating film formed on the first surface, a first hole formed in the first insulating film and partially extending into the first semiconductor substrate, a second hole formed in the second surface, a first electrode entirely filling the first hole, and a conductive film conformally formed in the second hole. The conductive film is electrically connected to a bottom surface of the first electrode and leaves a third hole in the first semiconductor substrate open. The third hole is configured to receive a second electrode of a second semiconductor substrate. |
申请公布号 |
US9318418(B2) |
申请公布日期 |
2016.04.19 |
申请号 |
US201514716791 |
申请日期 |
2015.05.19 |
申请人 |
TESSERA ADVANCED TECHNOLOGIES, INC. |
发明人 |
Kawashita Michihiro;Yoshimura Yasuhiro;Tanaka Naotaka;Naito Takahiro;Akazawa Takashi |
分类号 |
H01L21/00;H01L23/48;H01L21/683;H01L21/768;H01L23/00;H01L25/065;H01L25/00;H01L23/538;H01L23/522;H01L23/528;H01L25/07 |
主分类号 |
H01L21/00 |
代理机构 |
Haynes and Boone, LLP |
代理人 |
Haynes and Boone, LLP |
主权项 |
1. A semiconductor device comprising:
a first semiconductor substrate having a first surface and a second surface opposite the first surface; a first insulating film formed on the first surface; a first hole formed in the first insulating film and partially extending into the first semiconductor substrate; a second hole formed in the second surface; a single-piece first electrode entirely filling the first hole and comprising a portion that extends above the first insulating film, the portion being shaped to be inserted into a fourth hole of a third semiconductor substrate; a pad formed between the first insulating film and the first electrode; and a conductive film conformally formed in the second hole, the conductive film being electrically connected to a bottom surface of the first electrode and leaving a third hole in the first semiconductor substrate open, the third hole being configured to receive a second electrode of a second semiconductor substrate; wherein the second hole does not reach the pad. |
地址 |
San Jose CA US |