发明名称 |
ETCHING COMPOSITION FOR PATTERNED METAL LAYER |
摘要 |
The present invention relates to an etchant composition for a patterned metal layer used to manufacture an ultrathin layer liquid display device (TFT-LCD). The etchant composition for the patterned metal layer comprises: hydrogen peroxide as a main oxidant; and an organic composition or an inorganic composition containing one or more ions or the one or more ions selected from Ag, Fe, Cu, Ni, Mn, and Ce as an auxiliary oxidant. According to the present invention, the etchant composition forms a pixel electrode of a fine pattern at a rapid speed by improving an etchant speed using the auxiliary oxidant. Moreover, the etchant composition improves productivity by reducing a generation of a precipitate even if a number of processing is increased as the etchant composition improves solubility of a metal ion using a precipitation prevention agent. |
申请公布号 |
KR20160041873(A) |
申请公布日期 |
2016.04.18 |
申请号 |
KR20160037808 |
申请日期 |
2016.03.29 |
申请人 |
ENF TECHNOLOGY CO., LTD. |
发明人 |
KIM, SE HOON;LEE, BO YEON;KIM, SEUL KI;LEE, WOO JU;SHIN, HYO SEOP |
分类号 |
C23F1/16;C09K13/00;C23F1/30;C23F15/00 |
主分类号 |
C23F1/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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