发明名称 SYSTEM AND METHODS FOR DISTRIBUTING GAS IN A CHEMICAL VAPOR DEPOSITION REACTOR
摘要 SYSTEMS AND METHODS FOR THE PRODUCTION OF POLYSILICON OR ANOTHER MATERIAL VIA CHEMICAL VAPOR DEPOSITION IN A REACTOR ARE PROVIDED IN WHICH GAS IS DISTRIBUTED USING A SILICON STANDPIPE (42). THE SILICON STANDPIPE (42) CAN BE ATTACHED TO THE REACTOR SYSTEM (10) USING A NOZZLE COUPLER (25) SUCH THAT PRECURSOR GASES MAY BE INJECTED TO VARIOUS PORTIONS OF THE REACTION CHAMBER (12). AS A RESULT, GAS FLOW CAN BE IMPROVED THROUGHOUT THE REACTOR CHAMBER (12), WHICH CAN INCREASE THE YIELD OF POLYSILICON, IMPROVE THE QUALITY OF POLYSILICON, AND REDUCE THE CONSUMPTION OF ENERGY.
申请公布号 MY156940(A) 申请公布日期 2016.04.15
申请号 MY2010PI04477 申请日期 2009.03.26
申请人 GT SOLAR, INCORPORATED 发明人 QIN, WENJUN
分类号 C23C16/24 主分类号 C23C16/24
代理机构 代理人
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