| 摘要 |
The invention relates to a method for the measurement of a measurement object (24) by means of X-ray fluorescence, in particular for the measurement of the thickness of thin layers or determination of an element concentration of a measurement object (24), in which a primary beam (22) is directed from an X-ray radiation source (21) onto the measurement object (24), for which a secondary radiation (26) emitted by the measurement object (24) is detected by a detector (27) and is relayed to an evaluation device (29) in which the primary beam (22) is moved within a grid surface (31) which is divided into grid partial surfaces (1 . . . n) as well as subdivided into at least one line (Z1 . . . Zn) and at least one column (S1 . . . Sn), and for each grid partial surface (1 . . . n), a primary beam (22) is directed onto the grid surface (31), wherein a measuring spot (36) of the primary beam fills at least the grid point, wherein a lateral dimension of the measurement surface (25) of the measurement object (24) is detected, the lateral dimension of the measurement surface (25) of the measurement object (24) is compared to the size of the measuring spot (36) of the primary beam (22) appearing on the measurement object (24), for the determination of the size of the measurement surface (25) of the measurement object (24) which is smaller than the measuring spot (36), a size of the grid surface (31) is selected which covers at least the measurement surface (25) of the measurement object (24), a scaling factor α is determined from a ratio of the size of the grid surface (31) to the size of the measurement surface (25) of the measurement object (24), the detected spectrum of the secondary radiation (26) is added up from the respective grid partial surfaces (1 . . . n), averaged and subsequently multiplied by the scaling factor α and the spectrum of the secondary radiation (26) from the grid partial surfaces (1 . . . n) which is corrected with the scaling factor α is provided for the quantitative evaluation. |
