发明名称 Low-E Panels and Methods for Forming the Same
摘要 Embodiments provided herein describe low-e panels and methods for forming low-e panels. A transparent substrate is provided. A reflective layer is formed above the transparent substrate. A metal oxide layer is formed between the transparent substrate and the reflective layer. A base layer is formed between transparent substrate and the metal oxide layer. The base layer has a first refractive index. A dielectric layer is formed between the base layer and the metal oxide layer. The dielectric layer has a second refractive index.
申请公布号 US2016102013(A1) 申请公布日期 2016.04.14
申请号 US201414512644 申请日期 2014.10.13
申请人 Intermolecular Inc. 发明人 Zhang Guizhen;Cheng Jeremy;Ding Guowen;Ju Tong;Le Minh Huu;Schweigert Daniel
分类号 C03C17/34;G02B1/10;G02B5/28;C23C14/34;C23C14/18;C23C14/08;C03C17/36;C23C14/00 主分类号 C03C17/34
代理机构 代理人
主权项 1. A method for forming a low-e panel, the method comprising: providing a transparent substrate; forming a first base layer above the transparent substrate, wherein the first base layer comprises zinc and tin; forming a first dielectric layer above the first base layer, wherein the first dielectric layer comprises niobium; forming a first seed layer above the first dielectric layer, wherein the first seed layer comprises zinc; forming a first reflective layer above the first seed layer; forming a first barrier layer above the first reflective layer, wherein the first barrier layer comprises nickel, titanium, and niobium; forming a second base layer above the first barrier layer, wherein the second base layer comprises zinc and tin; forming a second dielectric layer above the second base layer, wherein the second dielectric layer comprises niobium; forming a second seed layer above the second dielectric layer, wherein the second seed layer comprises zinc; forming a second reflective layer above the second seed layer; forming a second barrier layer above the second reflective layer, wherein the second barrier layer comprises nickel, titanium, and niobium; forming a first over-coating layer above the second barrier layer, wherein the first over-coating layer comprises zinc and tin; forming a second over-coating layer above the first over-coating layer, wherein the second over-coating layer comprises zinc; and forming a capping layer above the second over-coating layer, wherein the first dielectric layer has a refractive index that is higher than a refractive index of the first base layer, and the second dielectric layer has a refractive index that is higher than a refractive index of the second base layer.
地址 San Jose CA US